Entegris and JSR Corporation/Inpria Corporation Sign Non-Exclusive EUV Lithography Cross-Licensing Agreement - geneonline.com

Entegris, JSR Corporation, and Inpria Corporation have entered into a non-exclusive cross-licensing agreement for extreme ultraviolet (EUV) lithography technology, marking a significant collaborative ... Read original →

This non-exclusive EUV photoresist cross-license between Entegris and JSR/Inpria is a tactical response to the materials bottleneck below 3nm. Technically, it accelerates convergence between metal-oxide (MOx) and chemically amplified resist (CAR) platforms, forcing ASML to refine source power and mask cleanliness specs. Strategically, the non-exclusive structure avoids scrutiny under the U.S. CHIPS Act while preserving licensing flexibility to Tokyo Electron or Shin-Etsu—enhancing supply chain resilience. Competitors like DuPont and Shin-Etsu will likely accelerate in-house EUV material development or even push a U.S.-Japan-Netherlands ‘resist alliance’ to counter ecosystem displacement. Over the next 12–24 months, expect more patent-pool-plus-joint-development models, especially as wafer fabs in Taiwan, China and South Korea ramp capacity—shifting EUV supply chain leverage from equipment to materials.