ASML denies US accusation an advanced machine reached China - DutchNews.nl

Dutch semiconductor equipment manufacturer ASML has denied U.S. allegations that its most advanced extreme ultraviolet (EUV) lithography machine may have reached China, following reports by Bloomberg.... Read original →

The unsubstantiated U.S. claim about ASML’s EUV reaching China reveals deeper anxiety over technological leakage. Technically, even without an EUV tool in China, the entire sub-3nm ecosystem—photoresists, masks, metrology—is under export control, making isolated breakthroughs impossible. Compliance burdens are surging: ASML now installs remote kill switches on DUV systems and faces intensified scrutiny on service logistics, raising costs for all global customers. TSMC (Taiwan, China) and Samsung may accelerate foundry expansions in the U.S., Japan, and Europe to capture high-end capacity displaced from China. Over the next 18 months, Washington will institutionalize 'friend-shoring,' likely pushing the Netherlands to restrict advanced DUV models like the NXT:2050i. Paradoxically, excessive controls will accelerate China’s full-stack autonomy in mature nodes (≥28nm), strengthening its dominance in automotive and industrial chips.